Investigation of machine learning for dual OPC and assist feature printing optimization-Reference-Cited by-同舟云学术

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Investigation of machine learning for dual OPC and assist feature printing optimization

Published:2019-03-20 Issue: Volume: Page:
ISSN:
Container-title:Design-Process-Technology Co-optimization for Manufacturability XIII
language:
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Author:

Guajardo Marco,Chen Yulu,Brooker Peter,Wu Rich,Hooker Kevin,Latinwo Folarin,Lucas Kevin

Publisher

SPIE

Reference7 articles.

1. Total Edge Placement Error Control for IC Manufacturing in 2020;Sturtevant,2017

2. Layout optimization with Assist Features placement by model-based rule tables for 2x node random contact.;Jun,2015

3. 3D resist profile modeling for OPC applications.;Fan,2013

4. 3D NTD resist deformation compact model for OPC and ILT applications.;Wu,2018

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2. Mask synthesis using machine learning software and hardware platforms;Optical Microlithography XXXIII;2020-03-23

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