1. 三维掩模光刻成像快速计算模型;Acta Optica Sinica;2023
2. EUV光刻三维掩模成像研究进展;Laser & Optoelectronics Progress;2022
3. How utilizing curvilinear design enables better manufacturing process window;Design-Process-Technology Co-optimization for Manufacturability XIV;2020-03-23
4. Mathematical Foundations of a Geometric Theory of Diffraction for Light Scattering from a 3D Topographic Photomask;2019 PhotonIcs & Electromagnetics Research Symposium - Spring (PIERS-Spring);2019-06
5. Deep learning assisted fast mask optimization;Optical Microlithography XXXI;2018-03-20