Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries
Author:
Affiliation:
1. Department of Chemical and Biological Engineering and Center for Nanotechnology, University of Wisconsin, Madison, Wisconsin 53706
2. Institut für Theoretische Physik, Georg-August Universität, 37077 Göttingen, Germany
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn700164p
Reference50 articles.
1. Molecular Self-Assembly and Nanochemistry: a Chemical Strategy for the Synthesis of Nanostructures
2. Self-Assembly at All Scales
3. Block Copolymer Thermodynamics: Theory and Experiment
4. Block Copolymers—Designer Soft Materials
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