Properties and performance of EUVL pellicle membranes-Reference-Cited by-同舟云学术

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Properties and performance of EUVL pellicle membranes

Published:2015-10-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Gallagher Emily E.,Vanpaemel Johannes,Pollentier Ivan,Zahedmanesh Houman,Adelmann Christoph,Huyghebaert Cedric,Jonckheere Rik,Lee Jae Uk

Publisher

SPIE

Reference18 articles.

1. Pellicle cover for projection printing system;Shea,1977

2. Pellicle protection of integrated circuit (IC) masks;Ron,1981

3. Pellicle for ArF excimer laser photolithography;Sakurai,1999

4. Experimental study of particle-free mask handling;Amemiya,2009

5. EUV mask particle adders during scanner exposure;Hyun,2015

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1. Comparing the mechanical stability of the pellicle under mask stage acceleration with different defect conditions;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21

2. Protective Free-Standing Films for Projection Lithography Installations in the Extreme UV Range;Russian Microelectronics;2023-10

3. Protective Freely Hanging Films for Projection Lithography Installations in the Extreme UV Range;Микроэлектроника;2023-09-01

4. Extreme ultraviolet pellicle wrinkles influence on mask 3D effects: experimental demonstration;Applied Optics;2023-08-11

5. Evaluation of the Mechanical Properties of Nanometer-Thick Graphite Film and Graphene Using the Bulge Test;Nano;2022-08

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