Affiliation:
1. Institute of Physics of Microstructures, Russian Academy of Sciences
Abstract
Variants of the structures of freely hanging films with a high transmittance coefficient at a wave-length of 13.5 nm, which were developed for use in the projection of extreme ultraviolet (EUV) lithography as protective and filtering elements, are considered. Our attention is focused on the most problematic—in terms of manufacturing and the requirements on their characteristics—ultrathin freely hanging films (pelli-cles), which are installed in front of the mask (photomask) in modern EUV scanners and serve to protect the sur-face of the mask from contamination. The main approaches used to manufacture ultrathin freely hanging large-aperture films are compared. A brief review of the research on the development of high transmittance pellicles at a wavelength of 11.2 nm, which may become an operating wavelength for future EUV lithography, is given.
Publisher
The Russian Academy of Sciences
Reference55 articles.
1. Hershel R. Pellicle protection of integrated circuit (IC) masks // Proc. SPIE. 1981. V. 275. P. 23–28.
2. Gallagher E.E., Vanpaemel J., Pollentier I., Zahedmanesh H., Adelmann C., Huyghebaert C., Jonckheere R., Lee J.U. Properties and performance of EUVL pellicle membranes // Proc. SPIE. 2015. V. 9635. P. 96350X.
3. Lilienfeld P. Application of Pellicles in Clean Surface Technology. In: Treatise on Clean Surface Technology. Springer, Boston, MA. 1987. P. 291.
4. French R.H., Feldman J., Zumsteg F.C., Crawford M.K., Feiring A.E., Petrov V.A., Schadt III F.L., Wheland R.C., Gordon J., Zhang E. Progress in materials development for 157 nm photolithography: photoresists and pellicles // Semiconductor Fabtech. 2001. V. 14. P. 167175.
5. van Look L., Bekaert J.P.M., Laenens B., Vandenberghe G., Richter J., Bubke K., Peters J.H., Schreel K., Dusa M.V. Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography // J. Micro/Nanolith. MEMS MOEMS. 2011. V. 10. № 1. P. 013009.