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Update on optical material properties for alternative EUV mask absorber materials

  • Published:2017-09-28 Issue: Volume: Page:
  • ISSN:
  • Container-title:33rd European Mask and Lithography Conference
  • language:
  • Short-container-title:

Author:

Laubis Christian,Vu Luong Kim,Philipsen Vicky,Scholze Frank

Publisher

SPIE

Reference24 articles.

1. Alternative materials for high-numerical aperture extreme-ultraviolet lithography mask stacks;Wood,2015

2. Mitigating EUV mask 3D effects by alternative metal absorbers;Philipsen,2016

3. Optimized EUV mask absorber stack for improved imaging by reducing crystallinity of alternative absorber materials;Luong,2016

4. Reducing EUV mask 3D effects by alternative metal absorbers;Philipsen,2017

5. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

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3. On the optical constants of cobalt in the M-absorption edge region;Optik;2023-02

4. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11

5. First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials;International Conference on Extreme Ultraviolet Lithography 2021;2021-10-12
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