First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials-Reference-Cited by-同舟云学术

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First results of EUV-scanner compatibility tests performed on novel 'high-NA' reticle absorber materials

Published:2021-10-12 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2021
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Author:

Stortelder Jetske,Ebeling Robert P.,Rijnsent Corné,van Putten Michel,de Rooij-Lohmann Veronique,Smit Maximilian,Storm Arnold J.,Koster Norbert,Lensen Henk A.,Philipsen Vicky,Opsomer Karl,Thakare Devesh,Feigl Torsten,Naujok Philipp

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications;Journal of Vacuum Science & Technology B;2024-08-06

2. Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-21

3. Evaluation of Ta-Co alloys as novel high-k EUV mask absorber;Optical and EUV Nanolithography XXXV;2022-05-26

4. Attenuated phase shift masks: a wild card resolution enhancement for extreme ultraviolet lithography?;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-11

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