Author:
Meng Xiangxi Z.,Käfer Florian H.,Wallraff Gregory M.,Ober Christopher K.,Segalman Rachel A.
Reference11 articles.
1. EUV Photolithography: Resist Progress and Challenges;Ober;Extreme Ultraviolet (EUV) Lithography IX,2018
2. Beyond EUV lithography: a comparative study of efficient photoresists' performance
3. The lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP);Conley,1996
4. New ESCAP-type resist with enhanced etch resistance and its application to future DRAM and logic devices
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