Recent developments in photoresists for extreme-ultraviolet lithography-Reference-Cited by-同舟云学术

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Recent developments in photoresists for extreme-ultraviolet lithography

Published:2023-07 Issue: Volume:280 Page:126020
ISSN:0032-3861
Container-title:Polymer
language:en
Short-container-title:Polymer

Author:

Ober Christopher K.^ORCID,Käfer Florian,Yuan Chenyun

Funder

Office of Science

U.S. Department of Energy

Basic Energy Sciences

Air Force Office of Scientific Research

Intel Corporation

Publisher

Elsevier BV

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference74 articles.

1. Introduction to Microlithography. Theory, materials, and processing;Thompson,1983

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1. Interface engineering of underlayer of chemically-amplified EUV photoresists to enhance the photolithographic performance;Materials Science and Engineering: B;2024-09

2. Balancing sensitivity and resolution by feedback regulation of free radicals from Sn-C bonds in tin-oxygen clusters EBL photoresist;Science China Materials;2024-08-22

3. Multifunctional Iron Oxide Nanoparticles as Promising Magnetic Biomaterials in Drug Delivery: A Review;Journal of Functional Biomaterials;2024-08-14

4. Effect of Free Radicals on Irradiation Chemistry of a Double-Coordination Organotin (Sn ₄ ) Photoresist by Adjusting Alkyl Ligands;CCS Chemistry;2024-08

5. Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group;Scientific Reports;2024-07-20

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