1. K.A. Goldberg et al., EUV photolithography: resist progress and challenges, in Extreme Ultraviolet (EUV) Lithography IX, 2018.
2. E. Buitrago et al., Chapter 4 - EUV lithography process challenges, in Frontiers of Nanoscience, A. Robinson, R. Lawson (Eds)., Elsevier. p. 135-176, 2016.
3. The role of underlayers in EUVL;Vanelderen;J. Photopolym. Sci. Technol.,2018
4. X. Hou, et al., Chemical trimming overcoat: an advanced spin-on process for photoresist enhancement in EUV lithography. in Advances in Patterning Materials and Processes XL, SPIE, 2023.
5. Polypeptoids: exploring the power of sequence control in a photoresist for extreme-ultraviolet lithography;Käfer;Adv. Mater. Technol.,2023