Affiliation:
1. Materials Science and Engineering Cornell University Ithaca NY 14853 USA
2. Chemistry and Chemical Biology Cornell University Ithaca NY 14853 USA
3. Materials Research Laboratory UC Santa Barbara Santa Barbara CA 93106 USA
Abstract
AbstractA new type of a positive tone chemically amplified photoresist based on well‐defined, sequence‐controlled polypeptoids with ten repeat‐units are synthesized and their potential for extreme‐UV lithography (EUVL) is demonstrated, resulting in line‐space patterns of 70 nm pitch. The synthesized samples contain 4‐(ethyl) phenol (Eph) and propyne (Ppy) side chains, while their change in solubility upon exposure is induced by the deprotection of 4‐(ethyl) phenol side groups. The resist performance is evaluated using deep UV and extreme‐UV lithography. While all samples are developable in isopropyl alcohol, the content, and the sequence of hydrophobic alkyne side chains lead to a detectable change in solubility, dissolution rate, and resist performance.
Funder
National Science Foundation
Intel Corporation
Subject
Industrial and Manufacturing Engineering,Mechanics of Materials,General Materials Science