Beyond EUV lithography: a comparative study of efficient photoresists' performance
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://www.nature.com/articles/srep09235.pdf
Reference35 articles.
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3. Oda, S. & Ferry, D. Silicon nanoelectronics. (Taylor and Francis, Boca Raton USA, 2006).
4. Peeters, R. et al. ASML's NXE platform performance and volume introduction. Proc SPIE 8679 10.1117/12.2010932 (2013).
5. Willson, C. G. & Roman, B. J. The future of lithography: SEMATECH Litho Forum 2008. ACS Nano 2, 1323–1328, 10.1021/Nn800410c (2008).
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