ASML's NXE platform performance and volume introduction-Reference-Cited by-同舟云学术

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ASML's NXE platform performance and volume introduction

Published:2013-04-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography IV
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Author:

Peeters Rudy,Lok Sjoerd,van Alphen Erwin,Harned Noreen,Kuerz Peter,Lowisch Martin,Meijer Henk,Ockwell David,van Setten Eelco,Schiffelers Guido,van der Horst Jan-Willem,Stoeldraijer Judon,Kazinczi Robert,Droste Richard,Meiling Hans,Kool Ron

Publisher

SPIE

Cited by 57 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System;CHIN J LASERS;2024

2. 4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node;IEEE Transactions on Electron Devices;2023-11

3. EUV Measurement Technologies;Tailored Light 2;2023-10-05

4. Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks;Photomask Technology 2022;2022-12-01

5. Process window improvement for fin cut layer in self-aligned double-patterning process based on backscattered electron imaging;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-04

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