Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks-Reference-Cited by-同舟云学术

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Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks

Published:2022-12-01 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2022
language:
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Author:

Saadeh Qais,Mesilhy Hazem,Soltwisch Victor,Erdmann Andreas,Ciesielski Richard,Lohr Leonhard,Andrle Anna,Philipsen Vicky,Thakare Devesh,Laubis Christian,Scholze Frank,Kolbe Michael

Publisher

SPIE

Reference45 articles.

1. Future Prospects for Solar EUV and Soft X-Ray Spectroscopy Missions;Young;Front. Astron. Space Sci. Sec. Stellar and Solar Physics,2021

2. EUV spectroscopy of highly charged xenon ions

3. Extreme-UV quiet Sun brightenings observed by the Solar Orbiter/EUI

4. Automatic feature selection in EUV scatterometry

5. Analysis of Line-Edge Roughness Using EUV Scatterometry

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology;Metrology, Inspection, and Process Control XXXVII;2023-04-27

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