Automatic feature selection in EUV scatterometry-Reference-Cited by-同舟云学术

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Automatic feature selection in EUV scatterometry

Published:2019-07-24 Issue:22 Volume:58 Page:5916
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Ansuinelli Paolo,Coene Wim M. J.,Urbach H. P.

Funder

H2020 Marie Skłodowska-Curie Actions (MSCA)

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference26 articles.

1. Critical dimension AFM tip characterization and image reconstruction applied to the 45-nm node

2. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring

3. Multiparameter grating metrology using optical scatterometry

4. Profile reconstruction in extreme ultraviolet (EUV) scatterometry: modeling and uncertainty estimates

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1. Nondestructive measurement of terahertz optical thin films by machine learning based on physical consistency;Optics Express;2024-04-18

2. Inverse scattering with a parametrized spatial spectral volume integral equation for finite scatterers;Journal of the Optical Society of America A;2023-09-01

3. A Laplace sensitivity operator enhances the calculation efficiency of OCD metrology;Optics Express;2023-01-09

4. Precise optical constants: determination and impact on metrology, simulation, and development of EUV masks;Photomask Technology 2022;2022-12-01

5. High-precision optical constant characterization of materials in the EUV spectral range: from large research facilities to laboratory-based instruments;37th European Mask and Lithography Conference;2022-11-01

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