Profile reconstruction in extreme ultraviolet (EUV) scatterometry: modeling and uncertainty estimates
Author:
Publisher
IOP Publishing
Subject
Applied Mathematics,Instrumentation,Engineering (miscellaneous)
Reference40 articles.
1. Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring
2. Erratum to “Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoring” [Thin Solid Films 455–456 (2004) 828–836]
3. Multiparameter grating metrology using optical scatterometry
4. Mathematical modelling of indirect measurements in scatterometry
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