A study of swing-curve physics in diffraction-based overlay-Reference-Cited by-同舟云学术

A study of swing-curve physics in diffraction-based overlay

Published:2016-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Bhattacharyya Kaustuve¹,den Boef Arie¹,Storms Greet¹,van Heijst Joost¹,Noot Marc¹,An Kevin¹,Park Noh-Kyoung¹,Jeon Se-Ra¹,Oh Nang-Lyeom²,McNamara Elliott¹,van de Mast Frank¹,Oh SeungHwa³,Lee Seung Yoon³,Hwang Chan³,Lee Kuntack³

Affiliation:

1. ASML Netherlands B.V. (Netherlands)

2. ASML Korea Co., Ltd. (Korea, Republic of)

3. Samsung Electronics Co., Ltd. (Korea, Republic of)

Publisher

SPIE

Reference8 articles.

1. The effect of individually-induced processes on image-based overlay and diffraction-based overlay;Oh,2014

2. Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

3. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections;Bhattacharyya,2013

4. High-order field-to-field corrections to achieve sub-20nm lithography requirements;Mulkens,2013

5. Evaluation of a novel ultra small target technology supporting on-product overlay measurements,;Smilde,2012

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