Overlay metrology performance of dry photoresist towards high-NA EUV lithography-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Overlay metrology performance of dry photoresist towards high-NA EUV lithography

Published:2024-04-10 Issue: Volume:12496 Page:59
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVIII
language:
Short-container-title:

Author:

Canga Eren,Blanco Carballo Victor M.,Charley Anne-Laure,Tabery Cyrus E.,Zacca Gabriel,Shamma Nader,Kam Benjamin,Brouri Mohand

Publisher

SPIE

Reference7 articles.

1. Achieving zero EUV patterning defect with dry photoresist system;Alvi,2022

2. Dry resist metrology readiness for high-NA EUVL;Francesco Lorusso,2023

3. Alignment and overlay through opaque metal layers;Blanco Carballo,2023

4. A study of swing-curve physics in diffraction-based overlay;Bhattacharyya,2016

5. Novel diffraction-based overlay metrology utilizing phase-based overlay for improved robustness;Matsunobu,2021

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP