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Ruthenium capping layer preservation for 100X clean through pH driven effects

  • Published:2015-10-23 Issue: Volume: Page:
  • ISSN:0277-786X
  • Container-title:SPIE Proceedings
  • language:
  • Short-container-title:

Author:

Dattilo Davide,Dietze Uwe,Hsu Jyh-Wei

Publisher

SPIE

Reference23 articles.

1. Chemical durability studies ofRu-capped EUV mask blanks;Shimomura,2008

2. Investigation of EUVL Reticle Capping Layer Peeling under Wet Cleaning;Singh,2013

3. Understanding the mechanism of capping layer damage and development of a robust capping material for 16 nm HP EUV mask;Jang,2013

4. Chemical Effect of Dry and Wet Cleaning of the Ru Protective Layer of the Extreme Ultraviolet (EUV) Lithography Reflector;Belau,2009

5. Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach

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1. Wet cleaning of Ta-based extreme ultraviolet photomasks at room temperature;Nanotechnology;2024-02-27

2. Reduced Graphene Oxide/Ruthenium Oxide Hexacyanoferrate Nanocomposite for Electrochemical Determination of Ethanol in Commercial Samples;Journal of the Brazilian Chemical Society;2021

3. Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B;2019-11

4. EUV capping layer integrity;Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology;2018-06-12

5. Mask Materials and Designs for Extreme Ultra Violet Lithography;Electronic Materials Letters;2018-03-21
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