1. Chemical durability studies of Ru-capped EUV mask blanks;Shimomura,2008
2. Efficient ozone, sulfate and ammonium free resist stripping process;Dattilo,2014
3. Investigation of mask defectivity in full field EUV lithography;Jonckheere,2008
4. Ruthenium capping layer preservation for 100X clean through pH driven effects
5. Clean induced feature CD shift of EUV mask;Nesládek,2016