1. Chen, A., Miyazaki, J.: EUV lithography insertion for high volume manufacturing: status and outlook. In: Proceedings of IEEE Electron Devices Technology and Manufacturing Conference, p. 77. IEEE Electron Devices Society, Toyama, Japan (2017)
2. Buitrago, E., Meeuwissen, M., Yildrim, O., Custers, R., Hoefnagels, R., Rispens, G., Vockenhuber, M., Mochi, I., Fallica, R., Tasdemir, Z., Ekinci, Y.: State-of-the-art EUV materials and processes for the 7nm node and beyond. Proc. SPIE 10143, 101430T (2017)
3. Kim, S.-S., Chalykh, R., Kim, H., Lee, S., Park, C., Hwang, M., Park, J., Park, J., Kim, H., Jeon, J., Kim, I., Lee, D., Na, J., Kim, J., Lee, S., Kim, H., Nam, S.: Progress in EUV lithography toward manufacturing. Proc. SPIE 10143, 1014306 (2017)
4. van Es, R., van de Kerkhof, M., Jasper, H., Levasier, L., Peeters, R.: EUV lithography industrialization progress. Proc. SPIE 10450, 1045003 (2017)
5. Fomenkov, I., Brandt, D., Ershov, A., Schafgans, A., Tao, Y., Vaschenko, G., Rokitski, S., Kats, M., Vargas, M., Purvis, M., Rafac, R., La Fontaine, B., De Dea, S., LaForge, A., Stewart, J., Chang, S., Graham, M., Riggs, D., Taylor, T., Abraham, M., Brown, D.: Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling. Adv. Opt. Technol. 6, 173 (2017)