Progress in EUV lithography toward manufacturing-Reference-Cited by-同舟云学术

Progress in EUV lithography toward manufacturing

Published:2017-03-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Kim Seong-Sue¹,Chalykh Roman¹,Kim Hoyeon¹,Lee Seungkoo¹,Park Changmin¹,Hwang Myungsoo¹,Park Joo-On¹,Park Jinhong¹,Kim Hocheol¹,Jeon Jinho¹,Kim Insung¹,Lee Donggun¹,Na Jihoon¹,Kim Jungyeop¹,Lee Siyong¹,Kim Hyunwoo¹,Nam Seok-Woo¹

Affiliation:

1. SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

Publisher

SPIE

Reference6 articles.

1. Highly Manufacturable 7nm FinFET Technology featuring EUV lithography for Low Power and High Performance Applications;Daewon,2017

2. Scaling LPP EUV sources to meet high-volume manufacturing requirements;Schafgans,2017

3. EUV mask imaging system based on the scanning reflective microscopy;Kim,2013

4. NXE Pellicle: offering a EUV pellicle solution to the industry;Brouns,2016

5. Calibration and verification of a stochastic model for EUV resist;Gaoa,2012

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