Laser-induced photoelectrochemical lithography-Reference-Cited by-同舟云学术

Laser-induced photoelectrochemical lithography

Published:2024 Issue:32 Volume:12 Page:12434-12443
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Du Bingqian¹²,Han Lianhuan³^ORCID,Guo Chengxin¹,Zhan Dongping¹²^ORCID,Tian Zhao-Wu¹

Affiliation:

1. State Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Engineering Research Center of Electrochemical Technologies of Ministry of Education, Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, China

2. Fujian Science & Technology Innovation Laboratory for Energy Materials of China (Tan Kah Kee Innovation Laboratory), Xiamen 361005, China

3. Pen-Tung Sah Institute of Micro-Nano Science and Technology, Xiamen University, Xiamen 361005, China

Abstract

Functional 3D-MNSs can be processed directly on semiconductor wafers with high precision and efficiency based on photoelectrochemical lithography, which does not require photoresists or any auxiliary processes.

Funder

Fundamental Research Funds for the Central Universities

Higher Education Discipline Innovation Project

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/TC/D4TC01509F

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