Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach-Reference-Cited by-同舟云学术

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Long-term stability of Ru-based protection layers in extreme ultraviolet lithography: A surface science approach

Published:2007 Issue:4 Volume:25 Page:1123
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Over H.,He Y. B.,Farkas A.,Mellau G.,Korte C.,Knapp M.,Chandhok M.,Fang M.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New EUV mask blank for N3 technology node and beyond;Photomask Technology 2023;2023-11-21

2. Quantitative analysis of trace levels of surface contamination by X-ray photoelectron spectroscopy. Part II: Systematic uncertainties and absolute quantification;Surface and Interface Analysis;2017-09-28

3. Methanol oxidation on stoichiometric and oxygen-rich RuO2(110);Physical Chemistry Chemical Physics;2017

4. Photo-Induced Morphology Changes at the RuO2(110)/TiO2(110) Surface: A Scanning Tunneling Microscopy Study;Topics in Catalysis;2016-09-12

5. Ruthenium capping layer preservation for 100X clean through pH driven effects;SPIE Proceedings;2015-10-23

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