Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Published:2019-11 Issue:6 Volume:37 Page:061607
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Luong Vu¹^ORCID,Philipsen Vicky¹,Opsomer Karl¹,Rip Jens¹,Hendrickx Eric¹,Heyns Marc¹,Detavernier Christophe²,Laubis Christian³,Scholze Frank³

Affiliation:

1. IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

2. COCOON, Department of Solid State Sciences, Universiteit Gent, Zwijnaardsesteenweg 294, B-9000 Gent, Belgium

3. Physikalisch-Technische Bundesanstalt (PTB), Abbestraße 2-12, 10587 Berlin, Germany

Funder

ECSEL JU

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5125662

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