Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Author:
Affiliation:
1. IMEC, Leuven, Belgium
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Arts and Humanities
Reference26 articles.
1. High-NA EUV lithography exposure tool: advantages and program progress
2. Underlayer optimization method for EUV lithography
3. Explorations of missing hole defect in EUV patterning
4. Pattern collapse mitigation strategies for EUV lithography
5. Fundamentals of EUV resist-inorganic hardmask interactions
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Relationship between the surface free energy of underlayers and the dissolution kinetics of poly(4-hydroxystyrene) partially protected by t-butoxycarbonyl groups in tetramethylammonium hydroxide aqueous developer;Japanese Journal of Applied Physics;2024-09-02
2. Novel EUV Underlayer Design for Metal Oxide Resist Patterning;Journal of Photopolymer Science and Technology;2024-06-25
3. Enhancement of photosensitivity and stability of Sn-12 EUV resist by integrating photoactive nitrate anion;Applied Surface Science;2024-05
4. Lithography performance improvement of MOR by underlayers;Advances in Patterning Materials and Processes XLI;2024-04-09
5. Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis;International Conference on Extreme Ultraviolet Lithography 2023;2023-11-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3