Publisher
SPIE-Intl Soc Optical Eng
Subject
General Arts and Humanities
Cited by
4 articles.
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1. Scaled-down deposited underlayers for EUV lithography;Advances in Patterning Materials and Processes XL;2023-05-01
2. Scaling and readiness of underlayers for high-NA EUV lithography;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01
3. Study on rinse material for pattern collapse mitigation in EUV lithography;International Conference on Extreme Ultraviolet Lithography 2022;2022-12-01
4. Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-15