Underlayer optimization method for EUV lithography
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SPIE
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Interface engineering of underlayer of chemically-amplified EUV photoresists to enhance the photolithographic performance;Materials Science and Engineering: B;2024-09
2. Understanding and improving performance of 14-nm HP EUV lithography via rational design of materials;Advances in Patterning Materials and Processes XLI;2024-04-09
3. Lithography performance improvement of MOR by underlayers;Advances in Patterning Materials and Processes XLI;2024-04-09
4. Scaling and readiness of underlayers for high-numerical aperture extreme ultraviolet lithography;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-15
5. Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-07-01
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