Lithography performance improvement of MOR by underlayers-Reference-Cited by-同舟云学术

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Lithography performance improvement of MOR by underlayers

Published:2024-04-09 Issue: Volume: Page:
ISSN:
Container-title:Advances in Patterning Materials and Processes XLI
language:
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Author:

Li Si,Lu Xinlin,Grannemann Stephen,Sweat Daniel,Brakensiek Kelsey E.,Lu Pengtao,Lowes Joyce A.,Krishnamurthy Vandana,Van Driessche Veerle,Guerrero Douglas

Publisher

SPIE

Reference24 articles.

1. Gearing up for high-NA EUV;Mark,2021

2. Stochastic effects in EUV lithography

3. Anamorphic high-NA EUV lithography optics;Migura;31st European Mask and Lithography Conference,2015

4. Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

5. High Sensitivity Resists for EUV Lithography: A Review of Material Design Strategies and Performance Results

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Approaching Angstrom-Scale Resolution in Lithography Using Low-Molecular-Mass Resists (<500 Da);ACS Nano;2024-08-20

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