Author:
Yaegashi Hidetami,Hara Arisa,Okada Soichiro,Shimura Satoru
Cited by
4 articles.
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1. Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-07-01
2. Multi-beam mask writer exposure optimization for EUV mask stacks;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-10-28
3. Randomness of Polymer Microstructure in the Resist Film as Shot Noise;Journal of Photopolymer Science and Technology;2021-06-11
4. Enabling EUV pattern transfer by optimized under layer;Advances in Patterning Materials and Processes XXXVIII;2021-02-22