Randomness of Polymer Microstructure in the Resist Film as Shot Noise
Author:
Affiliation:
1. Advanced Technology Development Department, Tokyo Electron Kyushu Ltd.
2. Process Technology Department, Tokyo Electron Kyushu Ltd.
3. TEL Corporate R&D, Tokyo Electron limited
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/34/1/34_55/_pdf
Reference9 articles.
1. 1. Kozawa, T., and Tagawa, S., “Radiation chemistry in chemically amplified resists”, Jap. J. Appl. Phys. 49 (2010)
2. 2. Tarutani, S., Tsubaki, H., and Kanna, S., “Development of materials and processes for negative tone development toward 32-nm node 193-nm immersion double-patterning process”, Proc. SPIE 7273, 72730C (2009)
3. 3. Cutler, C. A., Mackevich, J. F., Li, J., O'Connell, D. J., Cardinale, G. F., and Brainard, R. L., “Effect of Polymer Molecular Weight on AFM Polymer Aggregate Size and LER of EUV Resists”, Proc. of SPIE Vol. 5037 (2003)
4. 4. Yaegashi, H., Hara, A., Okada, S., and Shimura, S., “Explorations of missing hole defect in EUV patterning”, proc. of SPIE 11326-13 (2020)
5. 5. Hohle, C. K., Heckmann, N., Sebald, M., Markert, M., Stepanenko, N., Houlihan, F. M., Romano, A. R., Sakamuri, R., Rentkiewicz, D., and Dammel, R. R., “Surface roughness investigation of 157- and 193-nm polymer platforms using different etch conditions”, J. Microlith., Microfab., Microsyst. 4(4), 043009 (2005)
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1. Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering;Journal of Photopolymer Science and Technology;2023-06-15
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