Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography-Reference-Cited by-同舟云学术

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Overlay and edge placement control strategies for the 7nm node using EUV and ArF lithography

Published:2015-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Mulkens Jan,Hanna Michael,Wei Hannah,Vaenkatesan Vidya,Megens Henry,Slotboom Daan

Publisher

SPIE

Reference9 articles.

1. Yan Borodovsky, 2012 International Workshop on EUV Lithography, Maui, Hi

2. ITRS 2013

3. Holistic optimization architecture enabling sub-14-nm projection lithography

4. EUV source mask optimization for 7-nm node and beyond;Liu,2014

5. EUV resolution enhancement techniques (RET) for k1s below 0.4;Hsu,2015

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