Effect of the oxidation of TiN on the stability of the Al/TiN interface
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.362804
Reference19 articles.
1. Oxygen in titanium nitride diffusion barriers
2. Titanium nitride films with high oxygen concentration
3. Diffusion barriers in thin films
4. Investigation of reactively sputtered TiN films for diffusion barriers
5. Growth and properties of radio frequency reactively sputtered titanium nitride thin films
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3. Electrodeposition of platinum metal on TiN thin films;Electrochemistry Communications;2005-02
4. An investigation of the impact of a Ti barrier metal on the thermal stress field in passivated aluminium lines and vias in VLSI systems using finite element modelling approach;International Journal of Electronics;2000-11
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