CMOS compatible metal stacks for suppression of secondary grains in Sc0.125Al0.875N
Author:
Affiliation:
1. MESA Facility, Sandia National Laboratory, PO Box 5800, MS 1084, Albuquerque, New Mexico 87185-1084
Funder
U.S. Department of Energy
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5065517
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