Growth and properties of radio frequency reactively sputtered titanium nitride thin films-Reference-Cited by-同舟云学术

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Growth and properties of radio frequency reactively sputtered titanium nitride thin films

Published:1987-07 Issue:4 Volume:5 Page:1778-1782
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kumar N.,Pourrezaei K.,Fissel M.,Begley T.,Lee B.,Douglas E. C.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.574494

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1. Epitaxial growth of TiN on (0001) semi-insulating 4H-SiC substrate by reactive sputtering;Surface and Coatings Technology;2022-05

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3. A Review on Development and Optimization of Microheaters for High-Temperature In Situ Studies;Journal of Microelectromechanical Systems;2017-12

4. Electron/phonon coupling in group-IV transition-metal and rare-earth nitrides;Journal of Applied Physics;2013-11-21

5. Preparation of Ta-N and Ti-N Thin Films as a Capping Layer of CoFeB/MgO Magnetic Tunnel Junctions;Journal of the Japan Institute of Metals and Materials;2013

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