Surface composition and etching of III‐V semiconductors in Cl2ion beams
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.93188
Reference13 articles.
1. Plasma etching of III–V compound semiconductor materials and their oxides
2. GaInAsP/InP stripe‐geometry laser with a reactive‐ion‐etched facet
3. Plasma separation of InGaAsP/InP light‐emitting diodes
4. Reactive ion etching of GaAs in CCl2F2
5. Reactive ion beam etching of InP with Cl2
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