Novel short‐gas‐residence‐time electron cyclotron resonance plasma etching
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.110647
Reference6 articles.
1. Low‐temperature reactive ion etching and microwave plasma etching of silicon
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3. The interaction of Cl(2P3/2) and Cl(2P1/2) with n‐Si(100): Spontaneous etching
4. Ion enhanced gas-surface reactions: A kinetic model for the etching mechanism
5. Enhanced etching of Si(100) by neutral chlorine beams with kinetic energies up to 6 eV
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