Low‐temperature reactive ion etching and microwave plasma etching of silicon
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99382
Reference3 articles.
1. Formation of deep holes in silicon by reactive ion etching
2. Chemical sputtering of silicon by F+, Cl+, and Br+ ions: Reactive spot model for reactive ion etching
3. Low‐temperature ion beam enhanced etching of tungsten films with xenon difluoride
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