The Effect of Gas Flow Rate on Radio-Frequency Hollow Cathode Discharge Characteristics
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/1009-0630/16/i=7/a=07/pdf
Reference16 articles.
1. Flow rate effects in plasma etching
2. Novel short‐gas‐residence‐time electron cyclotron resonance plasma etching
3. Effects of gas flow ratio on silicon carbide thin film growth mode and polytype formation during gas‐source molecular beam epitaxy
4. Effects of gas flow rate on diamond deposition in a microwave plasma reactor
5. Effect of gas flow rates on PECVD-deposited nanocrystalline silicon thin film and solar cell properties
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