Observation of pressure gradient and related flow rate effect on the plasma parameters in plasma processing reactor
Author:
Publisher
AIP Publishing
Subject
Condensed Matter Physics
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3546011
Reference18 articles.
1. Flow rate effects in plasma etching
2. Novel short‐gas‐residence‐time electron cyclotron resonance plasma etching
3. Effects of gas flow ratio on silicon carbide thin film growth mode and polytype formation during gas‐source molecular beam epitaxy
4. Effects of gas flow rate on diamond deposition in a microwave plasma reactor
5. Effect of gas flow rates on PECVD-deposited nanocrystalline silicon thin film and solar cell properties
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