Deposition of amorphous silicon films by hot-wire chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.370202
Reference21 articles.
1. a‐Si : H produced by high‐temperature thermal decomposition of silane
2. Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon
3. Deposition of device quality, lowHcontent amorphous silicon
4. Production of high‐quality amorphous silicon films by evaporative silane surface decomposition
5. Mechanisms influencing “hot-wire” deposition of hydrogenated amorphous silicon
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