1. H. Matsumura, Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon. Appl. Phys. 65, 4402 (1989)
2. H. Wiesmann, A.K. Ghosh, T. McMohan, M. Srongin, a-Si: H produced by high-temperature thermal decomposition of silane. J. Appl. Phy. 50, 3754 (1979)
3. J. Doyle, R. Robertson, G.H. Lin, M.Z. He, A. Gallagher, Production of high-quality amorphous silicon films by evaporative silane surface decomposition. J. Appl. Phys. 64, 3215 (1988)
4. H. Matsumura, Catalytic chemical vapor deposition (CLT-CVD) Method to obtain high quality amorphous silicon alloys, in Amorphous Silicon Technology, ed. by A. Madan, M.J. Thompson, P.C. Taylor, P.G. LeComber, Y. Hamakawa, Materials Research Society Symp. Proc., vol. 118 (1988), p. 43
5. H. Matsumura, H. Tachibana, Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2., Appl. Phys. Lett. 47, 833 (1985)