Chemical depth profile of ultrathin nitrided SiO2 films
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1494121
Reference14 articles.
1. Structural stability of ultrathin silicon oxynitride film improved by incorporated nitrogen
2. Role of interfacial nitrogen in improving thin silicon oxides grown in N2O
3. Microscopic structure of theSiO2/Si interface
4. The effect of rapid thermal N2O nitridation on the oxide/Si(100) interface structure
5. Photoemission from the Sr/Si(001) interface
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