Role of the chamber wall in low‐pressure high‐density etching plasmas
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.359031
Reference35 articles.
1. Si Etching with Low Ion Energy in Low-Pressure Electron Cyclotron Resonance Plasma Generated by Longitudinal and Multipole Magnetic Fields
2. Novel radio‐frequency induction plasma processing techniques
3. Ion bombardment energy distributions in a radio frequency induction plasma
4. Electron cyclotron resonance microwave discharges for etching and thin‐film deposition
5. Potential applications of an electron cyclotron resonance multicusp plasma source
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