Potential applications of an electron cyclotron resonance multicusp plasma source-Reference-Cited by-同舟云学术

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Potential applications of an electron cyclotron resonance multicusp plasma source

Published:1990-05 Issue:3 Volume:8 Page:2900-2903
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Tsai C. C.,Berry L. A.,Gorbatkin S. M.,Haselton H. H.,Roberto J. B.,Stirling W. L.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576646

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Development of new steady-state, low-energy, and high-flux ion beam test device;Review of Scientific Instruments;2002-04

2. Vacuum Plasma Sources;Industrial Plasma Engineering;2001-08-25

3. Plasma Fundamentals for Materials Processing;Handbook of Advanced Plasma Processing Techniques;2000

4. A study of ion velocity distribution functions in processing plasmas produced by electron cyclotron resonance discharges;Journal of Applied Physics;1997-08

5. Characterization of electron cyclotron resonance source plasma for etching and deposition;Thin Solid Films;1997-07

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