Multifold study of volume plasma chemistry in Ar/CF4and Ar/CHF3CCP discharges
Author:
Funder
Russian Science Foundation
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://iopscience.iop.org/article/10.1088/1361-6595/aa72c9/pdf
Reference106 articles.
1. Plasma processing of low-k dielectrics
2. Low dielectric constant materials for microelectronics
3. Experimental and theoretical study of RF capacitively coupled plasma in Ar–CF4–CF3I mixtures
4. Experimental and Theoretical Studies of Radical Production in RF CCP Discharge at 81-MHz Frequency in $\hbox{Ar/CF}_{4}$ and $\hbox{Ar/CHF}_{3}$ Mixtures
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