Conformality in atomic layer deposition: Current status overview of analysis and modelling-Reference-Cited by-同舟云学术

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Conformality in atomic layer deposition: Current status overview of analysis and modelling

Published:2019-06 Issue:2 Volume:6 Page:021302
ISSN:1931-9401
Container-title:Applied Physics Reviews
language:en
Short-container-title:Applied Physics Reviews

Author:

Cremers Véronique¹,Puurunen Riikka L.²³^ORCID,Dendooven Jolien¹^ORCID

Affiliation:

1. Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Ghent, Belgium

2. Department of Chemical and Metallurgical Engineering, Aalto University School of Chemical Engineering, P.O. Box 16100, FI-00076 AALTO, Finland

3. VTT Technical Research Centre of Finland, P.O. Box 1000, FI-02044 VTT, Finland

Funder

SIM-Flanders

European Cooperation in Science and Technology

Tekes

Fonds Wetenschappelijk Onderzoek

Finnish Centre of Excellence in Atomic Layer Deposition

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5060967

Reference262 articles.

1. Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

2. From V. B. Aleskovskii's “Framework” Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition

3. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy

4. Atomic Layer Deposition: An Overview

5. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

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