H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum-Reference-Cited by-同舟云学术

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H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum

Published:2024-12 Issue: Volume:750 Page:122580
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Wang Yingying,Guo Jiayi,Bai Chenqi,Xu Lina,Xiao Hongping,Shi Qian,Ding Yihong,Li Aidong,Fang Guoyong^ORCID

Funder

National Natural Science Foundation of China

National Laboratory of Solid State Microstructures, Nanjing University

Natural Science Foundation of Zhejiang Province

Publisher

Elsevier BV

Reference60 articles.

1. Principle and Application of Atomic Layer Deposition Technology;Li,2016

2. Atomic Layer Deposition for Nanotechnology;Sherman,2008

3. Atomic Layer Deposition of Nanostructured Materials;Pinna,2011

4. Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications;Kääriäinen,2013

5. Atomic Layer Deposition for Semiconductors;Hwang,2014

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