Quantum chemical study of the mechanism of aluminum oxide atomic layer deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1473237
Reference9 articles.
1. Surface Chemistry for Atomic Layer Growth
2. Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry
3. The reaction pathway for the growth of alumina on high surface area alumina and in ultrahigh vacuum by a reaction between trimethyl aluminum and water
4. Sequential surface chemical reaction limited growth of high quality Al2O3dielectrics
5. In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al2O3 Thin Films from Trimethylaluminum and Water
Cited by 172 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. H2O-based atomic layer deposition mechanism of aluminum oxide using trimethylaluminum;Surface Science;2024-12
2. Exploring TMA and H2O Flow Rate Effects on Al2O3 Thin Film Deposition by Thermal ALD: Insights from Zero-Dimensional Modeling;Coatings;2024-05-07
3. Investigation of atomic layer deposition methods of Al2O3 on n-GaN;Journal of Applied Physics;2024-02-22
4. Effect of oxidant sources on carbon-related impurities in ALD-Al2O3 for solid-state devices;Applied Physics Express;2023-09-01
5. Multiscale CFD modelling for conformal atomic layer deposition in high aspect ratio nanostructures;Chemical Engineering Journal;2023-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3