In Situ Mass Spectrometry Study on Surface Reactions in Atomic Layer Deposition of Al2O3 Thin Films from Trimethylaluminum and Water
Author:
Affiliation:
1. Laboratory of Inorganic Chemistry, Department of Chemistry, University of Helsinki, P.O. Box 55, FIN-00014 Helsinki, Finland
Publisher
American Chemical Society (ACS)
Subject
Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/la991183%2B
Reference38 articles.
1. Atomic layer epitaxy
2. Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes
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