Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes-Reference-Cited by-同舟云学术

Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes

Published:1991-08 Issue:4 Volume:28 Page:379-388
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Hiltunen L.,Kattelus H.,Leskelä M.,Mäkelä M.,Niinistö L.,Nykänen E.,Soininen P.,Tiittad M.

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference31 articles.

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4. Photodeposition of aluminum oxide and aluminum thin films

5. Photo-CVD of Al2O3Thin Films

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